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Phire Hot Start DNA Polymerase

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Science 11 October 2002:
Vol. 298. no. 5592, p. 319
DOI: 10.1126/science.298.5592.319b
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Conformal thin-film deposition allows even deep troughs in a substrate to be coated uniformly. Atomic-layer deposition (ALD) can be used to grow high-quality conformal films but is often slow because each cycle deposits only a single layer. Hausmann et al. (p. 402) have modified ALD so that they can deposit more than 30 monolayers of silica in a single cycle. Alternating vapor pulses of trimethylaluminum and tris(tert-butoxy)silanol reacted to form a silica and alumina laminate of uniform thickness even inside deep glass channels.




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Science. ISSN 0036-8075 (print), 1095-9203 (online)