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Science 15 May 2009:
Vol. 324. no. 5929, pp. 892 - 893
DOI: 10.1126/science.1174224
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Perspectives

Applied Physics:

Two Beams Squeeze Feature Sizes in Optical Lithography

Joseph W. Perry

The fabrication of electronic circuits on chips relies on the patterning of surfaces by optical lithography, which is used to control where different components—metal wires, semiconductor gates, and oxide insulators—form (1). Three papers in this issue (2–4) report a new approach to optical lithography that allows small feature sizes to be created more easily than with traditional approaches.

School of Chemistry and Biochemistry and Center for Organic Photonics and Electronics, Georgia Institute of Technology, Atlanta, GA 30332, USA.

E-mail: joe.perry{at}gatech.edu

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Science. ISSN 0036-8075 (print), 1095-9203 (online)