Note to users. If you're seeing this message, it means that your browser cannot find this page's style/presentation instructions -- or possibly that you are using a browser that does not support current Web standards. Find out more about why this message is appearing, and what you can do to make your experience of our site the best it can be.

Science 22 February 2008:
Vol. 319. no. 5866, pp. 1050 - 1051
DOI: 10.1126/science.1153901
Prev | Table of Contents | Next

Perspectives

MATERIALS SCIENCE:
The Cutting Edge of Plasma Etching

Thorsten Lill1 Olivier Joubert2

Better etching methods for creating more finely structured microcircuits will require close attention to basic plasma physics and surface chemistry.

1Applied Materials Inc., Santa Clara, CA 95054, USA.

2Laboratoire des Technologies de la Micro-électronique-Centre Nationale de la Recherche Scientifique, 38054 Grenoble, France. E-mail: thorsten_lill{at}amat.com

Read the Full Text

To Advertise     Find Products

Science. ISSN 0036-8075 (print), 1095-9203 (online)