An Efficient Two-Photon-Generated Photoacid Applied to Positive-Tone 3D Microfabrication
Wenhui Zhou,1
Stephen M. Kuebler,1
Kevin L. Braun,1
Tianyue Yu,3
J. Kevin Cammack,1
Christopher K. Ober,3*
Joseph W. Perry,12*
Seth R. Marder12*
A two-photon-activatable photoacid generator,
based on a bis[(diarylamino) styryl]benzene core with
covalently attached sulfonium moieties, has been synthesized. The
photoacid generator has both a large two-photon absorption cross
section (
= 690 × 10
50
centimeter4 second per photon) and a high quantum yield for
the photochemical generation of acid
(
H+ = 0.5). Under near-infrared laser
irradiation, the molecule produces acid after two-photon excitation and
initiates the polymerization of epoxides at an incident intensity
that is one to two orders of magnitude lower than that needed for
conventional ultraviolet-sensitive initiators. This photoacid generator
was used in conjunction with a positive-tone chemically amplified
resist for the fabrication of a three-dimensional (3D) microchannel
structure.
1 Department of Chemistry,
2 Optical Sciences Center, University of Arizona,
Tucson, AZ 85721, USA.
3 Department of Materials
Science and Engineering, Cornell University, Ithaca, NY 14853, USA.
*
To whom correspondence should be addressed. E-mail:
cober{at}ccmr.cornell.edu (C.K.O.); jwperry{at}u.arizona.edu
(J.W.P.); smarder{at}u.arizona.edu (S.R.M.).