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Science 2 April 1999:
Vol. 284. no. 5411, pp. 138 - 141
DOI: 10.1126/science.284.5411.138
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Reports

Electrochemical Defect-Mediated Thin-Film Growth

K. Sieradzki, * S. R. , Brankovic, N. Dimitrov

An electrodeposition technique is described that produces atomically flat epitaxial metal overlayers of quality similar to that obtained by ultrahigh vacuum techniques at elevated temperature. In this approach, a metal of interest such as silver is co-deposited with a reversibly deposited mediator metal. The mediator is periodically deposited and stripped from the surface, and this serves to significantly increase the density of two-dimensional islands of silver atoms, promoting a layer-by-layer thin-film growth mode. In situ scanning tunneling microscopy was used to demonstrate the growth process for the heteroepitaxial system silver/gold (111) with either lead or copper as the mediator.

Department of Mechanical and Aerospace Engineering, Arizona State University, Tempe, AZ 85287-6106, USA.
*   To whom correspondence should be addressed. E-mail: karl@icarus.eas.asu.ed

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Science. ISSN 0036-8075 (print), 1095-9203 (online)