Planar Patterned Magnetic Media Obtained by Ion Irradiation
C. Chappert,
H. Bernas,
J. Ferré,
V. Kottler,
J.-P. Jamet,
Y. Chen,
E. Cambril,
T. Devolder,
F. Rousseaux,
V. Mathet,
H. Launois
By ion irradiation through a lithographically made resist mask, the
magnetic properties of cobalt-platinum simple sandwiches and
multilayers were patterned without affecting their roughness and
optical properties. This was demonstrated on arrays of 1-micrometer lines by near- and far-field magnetooptical microscopy. The coercive force and magnetic anisotropy of the irradiated regions can be accurately controlled by the irradiation fluence. If combined with
high-resolution lithography, this technique holds promise for
ultrahigh-density magnetic recording applications.
C. Chappert, V. Kottler, T. Devolder, V. Mathet, Institut
d'Electronique Fondamentale, Unité de Recherche Associée
CNRS 022, Université Paris Sud, 91405 Orsay Cedex, France.
H. Bernas, Centre de Spectrométrie Nucléaire et de
Spectrométrie de Masse, Unité Propre de Recherche CNRS
6412, Université Paris Sud, 91405 Orsay Cedex, France.
J. Ferré and J.-P. Jamet, Laboratoire de Physique des Solides,
Unité de Recherche Associée CNRS 02, Université Paris
Sud, 91405 Orsay Cedex, France.
V. Kottler, Y. Chen, E. Cambril, F. Rousseaux, H. Launois, Laboratoire
de Microstructures et de Microélectronique, Unité Propre de
Recherche CNRS 020, 196 Avenue H. Ravera, BP 107, 92225 Bagneux Cedex,
France.
