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Science 4 August 1995:
Vol. 269. no. 5224, pp. 664 - 666
DOI: 10.1126/science.7624795
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Articles

Science, Vol 269, Issue 5224, 664-666
Copyright © 1995 by American Association for the Advancement of Science

articles

Fabrication of submicrometer features on curved substrates by microcontact printing

RJ Jackman, JL Wilbur, and GM Whitesides

Department of Chemistry, Harvard University, Cambridge, MA 02138, USA.

Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.


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