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Science 26 April 1991:
Vol. 252. no. 5005, pp. 551 - 554
DOI: 10.1126/science.2020853
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Articles

Science, Vol 252, Issue 5005, 551-554
Copyright © 1991 by American Association for the Advancement of Science

articles

Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies

CS Dulcey, JH Georger Jr, V Krauthamer, DA Stenger, TL Fare, and JM Calvert

Geo-Centers, Inc., Fort Washington, MD 20744.

Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.


THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Microlithography by using neutral metastable atoms and self-assembled monolayers.
K. Berggren, A Bard, J. Wilbur, J. Gillaspy, A. Helg, J. McClelland, S. Rolston, W. Phillips, M Prentiss, and G. Whitesides (1995)
Science 269, 1255-1257
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Adhesive Electroless Metallization of Fluoropolymeric Substrates.
T. G. Vargo, J. A. Gardella Jr., J. M. Calvert, and M.-S. Chen (1993)
Science 262, 1711-1712
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