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Science 11 January 1991:
Vol. 251. no. 4990, pp. 183 - 186
DOI: 10.1126/science.251.4990.183

Articles

Atomic-Resolution Electrochemistry with the Atomic Force Microscope: Copper Deposition on Gold

S. MANNE 1, P. K. HANSMA 1, J. MASSIE 2, V. B. ELINGS 2, and A. A. GEWIRTH 3

1 Department of Physics, University of California, Santa Barbara, Santa Barbara, CA 93106
2 Digital Instruments, 6780 Cortona Drive, Santa Barbara, CA 93117
3 School of Chemical Sciences, University of Illinois, Urbana, IL 61801

The atomic force microscope (AFM) was used to image an electrode surface at atomic resolution while the electrode was under potential control in a fluid electrolyte. A new level of subtlety was observed for each step of a complete electrochemical cycle that started with an Au(111) surface onto which bulk Cu was electrodeposited. The Cu was stripped down to an underpotential-deposited monolayer and finally returned to a bare Au(111) surface. The images revealed that the underpotential-deposited monolayer has different structures in different electrolytes. Specifically, for a perchloric acid electrolyte the Cu atoms are in a close-packed lattice with a spacing of 0.29 ± 0.02 nanometer (nm). For a sulfate electrolyte they are in a more open lattice with a spacing of 0.49 ± 0.02 nm. As the deposited Cu layer grew thicker, the Cu atoms converged to a (111)-oriented layer with a lattice spacing of 0.26 ± 0.02 nm for both electrolytes. A terrace pattern was observed during dissolution of bulk Cu. Images were obtained of an atomically resolved Cu monolayer in one region and an atomically resolved Au substrate in another in which a 30° rotation of the Cu monolayer lattice from the Au lattice is clearly visible.

Submitted on July 27, 1990
Accepted on October 19, 1990


THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
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