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Published Online September 25, 2008
Science DOI: 10.1126/science.1162950

Reports

Submitted on July 8, 2008
Accepted on September 5, 2008

Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

Chuanbing Tang 1, Erin M. Lennon 2, Glenn H. Fredrickson 3*, Edward J. Kramer 3*, Craig J. Hawker 4*

1 Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA.
2 Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA.; Department of Chemical Engineering, University of California, Santa Barbara, CA 93106, USA.
3 Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA.; Department of Chemical Engineering, University of California, Santa Barbara, CA 93106, USA.; Department of Materials, University of California, Santa Barbara, CA 93106, USA.
4 Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA.; Department of Materials, University of California, Santa Barbara, CA 93106, USA.; Department of Chemistry and Biochemistry, University of California, Santa Barbara, CA 93106, USA.

* To whom correspondence should be addressed.
Glenn H. Fredrickson , E-mail: ghf{at}mrl.ucsb.edu
Edward J. Kramer , E-mail: edkramer{at}mrl.ucsb.edu
Craig J. Hawker , E-mail: hawker{at}mrl.ucsb.edu

The manufacture of smaller, faster and more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. While traditional self-assembling approaches based on block copolymer lithography spontaneously form nanometer sized hexagonal structures, these features are not consistent with the industry standard rectilinear coordinate system. In this work, a modular and hierarchical self-assembly strategy, combining supramolecular assembly of hydrogen-bonding units with controlled phase separation of diblock copolymers, is presented for the generation of nanoscale square patterns. These square arrays hold particular promise for simplicity of addressability and circuit interconnection in integrated circuit manufacturing and nanotechnology.


THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Macroscopic 10-Terabit-per-Square-Inch Arrays from Block Copolymers with Lateral Order.
S. Park, D. H. Lee, J. Xu, B. Kim, S. W. Hong, U. Jeong, T. Xu, and T. P. Russell (2009)
Science 323, 1030-1033
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Science. ISSN 0036-8075 (print), 1095-9203 (online)