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Science 15 August 2008:
Vol. 321. no. 5891, pp. 936 - 939
DOI: 10.1126/science.1157626
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Reports

Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

Ricardo Ruiz,1* Huiman Kang,2 François A. Detcheverry,2 Elizabeth Dobisz,1 Dan S. Kercher,1 Thomas R. Albrecht,1 Juan J. de Pablo,2 Paul F. Nealey2*

Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.

1 Hitachi Global Storage Technologies, San Jose Research Center, 3403 Yerba Buena Road, San Jose, CA 95135, USA.
2 Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706, USA.

* To whom correspondence should be addressed. E-mail: Ricardo.Ruiz{at}hitachigst.com (R.R.); nealey{at}engr.wisc.edu (P.F.N.)

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THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Macroscopic 10-Terabit-per-Square-Inch Arrays from Block Copolymers with Lateral Order.
S. Park, D. H. Lee, J. Xu, B. Kim, S. W. Hong, U. Jeong, T. Xu, and T. P. Russell (2009)
Science 323, 1030-1033
   Abstract »    Full Text »    PDF »
Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates.
I. Bita, J. K. W. Yang, Y. S. Jung, C. A. Ross, E. L. Thomas, and K. K. Berggren (2008)
Science 321, 939-943
   Abstract »    Full Text »    PDF »


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