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Science 1 July 2005:
Vol. 309. no. 5731, pp. 113 - 115
DOI: 10.1126/science.1112666
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Reports

On-Wire Lithography

Lidong Qin, Sungho Park, Ling Huang, Chad A. Mirkin*

We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of five to several hundred nanometers. We studied the transport properties of 13-nanometer gaps with and without nanoscopic amounts of conducting polymers deposited within by dip-pen nanolithography.

Department of Chemistry and Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208–3113, USA.

* To whom correspondence should be addressed. E-mail: chadnano{at}northwestern.edu

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THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Designing, fabricating, and imaging Raman hot spots.
L. Qin, S. Zou, C. Xue, A. Atkinson, G. C. Schatz, and C. A. Mirkin (2006)
PNAS 103, 13300-13303
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Science. ISSN 0036-8075 (print), 1095-9203 (online)