Molecular Rulers for Scaling Down Nanostructures
A. Hatzor,
P. S. Weiss*
A method of constructing <30-nanometer structures in close
proximity with precise spacings is presented that uses the step-by-step application of organic molecules and metal ions as size-controlled resists on predetermined patterns, such as those formed by
electron-beam lithography. The organic molecules serve as a ruler for
scaling down a larger "parent" structure. After metal deposition
and lift-off of the organic multilayer resist, an isolated smaller
structure remains on the surface. This approach is used to form thin
parallel wires (15 to 70 nanometers in width and 1 micrometer long) of controlled thickness and spacing. The structures obtained were imaged
with field emission scanning electron microscopy. A variety of
nanostructures could be scaled down, including structures with hollow
patterns.
Department of Chemistry, Penn State University, University Park,
PA, 16802-6300, USA.
*
To whom correspondence should be addressed. E-mail:
stm{at}psu.edu