Note to users. If you're seeing this message, it means that your browser cannot find this page's style/presentation instructions -- or possibly that you are using a browser that does not support current Web standards. Find out more about why this message is appearing, and what you can do to make your experience of our site the best it can be.

Science 9 February 2001:
Vol. 291. no. 5506, pp. 1019 - 1020
DOI: 10.1126/science.1057553
Prev | Table of Contents | Next

Reports

Molecular Rulers for Scaling Down Nanostructures

A. Hatzor, P. S. Weiss*

A method of constructing <30-nanometer structures in close proximity with precise spacings is presented that uses the step-by-step application of organic molecules and metal ions as size-controlled resists on predetermined patterns, such as those formed by electron-beam lithography. The organic molecules serve as a ruler for scaling down a larger "parent" structure. After metal deposition and lift-off of the organic multilayer resist, an isolated smaller structure remains on the surface. This approach is used to form thin parallel wires (15 to 70 nanometers in width and 1 micrometer long) of controlled thickness and spacing. The structures obtained were imaged with field emission scanning electron microscopy. A variety of nanostructures could be scaled down, including structures with hollow patterns.

Department of Chemistry, Penn State University, University Park, PA, 16802-6300, USA.
*   To whom correspondence should be addressed. E-mail: stm{at}psu.edu

Read the Full Text

To Advertise     Find Products

Science. ISSN 0036-8075 (print), 1095-9203 (online)