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Science 6 October 2000:
Vol. 290. no. 5489, pp. 107 - 111
DOI: 10.1126/science.290.5489.107
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Reports

Optically Defined Multifunctional Patterning of Photosensitive Thin-Film Silica Mesophases

Dhaval A. Doshi,1 Nicola K. Huesing,3 Mengcheng Lu,1 Hongyou Fan,15 Yunfeng Lu,4 Kelly Simmons-Potter,5 B. G. Potter Jr.,5 Alan J. Hurd,5 C. Jeffrey Brinker125*

Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed siloxane condensation, which can be used for selective etching of unexposed regions; for "gray-scale" patterning of refractive index, pore size, surface area, and wetting behavior; and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.

1 Department of Chemical and Nuclear Engineering and Center for Micro-Engineered Materials, Advanced Materials Laboratory, University of New Mexico, 1001 University Boulevard SE, Albuquerque, NM 87106, USA.
2 Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, USA.
3 Institute of Inorganic Chemistry, Vienna University of Technology, Vienna, Austria.
4 Applied Materials, Santa Clara, CA 95054, USA.
5 Sandia National Laboratories, Albuquerque, NM 87185, USA.
*   To whom correspondence should be addressed. E-mail: cjbrink{at}sandia.gov

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THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Self-Assembly of Ordered, Robust, Three-Dimensional Gold Nanocrystal/Silica Arrays.
H. Fan, K. Yang, D. M. Boye, T. Sigmon, K. J. Malloy, H. Xu, G. P. Lopez, and C. J. Brinker (2004)
Science 304, 567-571
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Science. ISSN 0036-8075 (print), 1095-9203 (online)