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Science 19 November 1993:
Vol. 262. no. 5137, pp. 1249 - 1252
DOI: 10.1126/science.262.5137.1249
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Articles

Growth of High Aspect Ratio Nanometer-Scale Magnets with Chemical Vapor Deposition and Scanning Tunneling Microscopy

Andrew D. Kent 1, Thomas M. Shaw 1, Stephan von Molnár 1, and David D. Awschalom 2

1 IBM Research Division, T. J. Watson Research Center, Post office Box 218, Yorktown Heights, NY 10598
2 Department of Physics, University of California, Santa Barbara, CA 93106

A combination of chemical vapor deposition and scanning tunneling microscopy techniques have been used to produce nanometer-scale, iron-containing deposits with high aspect ratios from an iron pentacarbonyl precursor both on a substrate and on the tunneling tip itself. The structure and composition of the resulting nanodeposits were determined by transmission electron microscopy and high spatial resolution Auger electron spectroscopy. Either polycrystalline, relatively pure, body-centered-cubic iron or disordered carbon-rich material can be deposited, depending on the bias conditions of the tip sample junction and the precursor pressure. Two mechanisms of decomposition are inferred from the growth phenomenology.

Submitted on July 9, 1993
Accepted on September 8, 1993


THIS ARTICLE HAS BEEN CITED BY OTHER ARTICLES:
Magnetization Directions of Individual Nanoparticles.
S. A. Majetich and Y. Jin (1999)
Science 284, 470-473
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