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Science 17 July 1992:
Vol. 257. no. 5068, pp. 375 - 377
DOI: 10.1126/science.257.5068.375
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Articles

Machining Oxide Thin Films with an Atomic Force Microscope: Pattern and Object Formation on the Nanometer Scale

Yun Kim 1 and Charles M. Lieber 1

1 Department of Chemistry and Division of Applied Sciences, Harvard University, Cambridge, MA 02138

An atomic force microscope (AFM) has been used to machine complex patterns and to form free structural objects in thin layers of MoO3 grown on the surface of MoS2. The AFM tip can pattern lines with le10-nanometer resolution and then image the resulting structure without perturbation by controlling the applied load. Distinct MoO3 structures can also be defined by AFM machining, and furthermore these objects can be manipulated on the MoS2 substrate surface with the AFM tip. These results suggest application to nanometer-scale diffraction gratings, high-resolution lithography masks, and possibly the assembly of nanostructures with novel properties.

Submitted on April 3, 1992
Accepted on May 11, 1992


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