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Science 27 January 1978:
Vol. 199. no. 4327, pp. 421 - 422
DOI: 10.1126/science.199.4327.421
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Articles

Chemical Etching of Fission Tracks in Polyfluoro Plastics

YOSHIHIDE KOMAKI 1 and SHIGEO TSUJIMURA 1

1 Division of Chemistry, Japan Atomic Energy Research Institute, Tokai-mura, Naka-gun, Ibaraki-ken, Japan

A method has been developed for the chemical etching of fission tracks in polyfluoro plastics. The formation of fine holes several tens of nanometers in diameter in polyvinylidene fluoride films, bombarded by fission fragments in oxygen and etched in 5-normal sodium hydroxide solution at 85°C, was confirmed by electron microscopy.

Submitted on April 21, 1977
Revised on September 7, 1977

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Science. ISSN 0036-8075 (print), 1095-9203 (online)